Equipment Rates

Academic, Start-Up and Industry Rates (subject to change)

Academic Members Monthly Cap: $1450

[vc_table vc_table_theme=”classic” allow_html=”1″ el_class=”equipment-table”][b;align-center]Equipment,[b;align-center]Manufacturer,[b;align-center]Badger%20Name,[b;align-center]Academic%20Rate%20(%24%2Fhr),[b;align-center]Start-Up%20Rate%20(%24%2Fhr),[b;align-center]Industry%20Rate%20(%24%2Fhr)|Dicing%20Saw,Disco,Dicing_Saw_DAD3220,[align-center]23,[align-center]69,[align-center]115|Film%20Frame%20Wafer%20Mounter,Ultron%20Systems,Tape_Mount_UH114,[align-center]0,[align-center]0,[align-center]0|UV%20Curing%20System%20,Ultron%20Systems,UV%20_Curing_%20UH102,[align-center]0,[align-center]0,[align-center]0|Wire%20Bonder%20,West%20Bond,Wire_Bonder_454647E,[align-center]23,[align-center]69,[align-center]115|Spin%20Rinse%20Dryer,OEM%20Group,SRD_470S,[align-center]0,[align-center]0,[align-center]0|HF%20%2F%20Piranha%20Hood,Air%20Control,HF_Piranha_Hood,[align-center]0,[align-center]0,[align-center]0|Resist%20Hood,Air%20Control,Spinner_Hood,[align-center]0,[align-center]0,[align-center]0|RCA%20Cleaning%20Hood,Air%20Control,RCA_Hood,[align-center]0,[align-center]0,[align-center]0|Metal%C2%A0%20%2F%20Caustic%20Etch%20Hood,Air%20Control,Caustic_Hood,[align-center]0,[align-center]0,[align-center]0|Development%20Hood%20,Air%20Control,Developer_Hood,[align-center]0,[align-center]0,[align-center]0|Solvent%20Hood,Air%20Control,Solvent_Hood,[align-center]0,[align-center]0,[align-center]0|Atomic%20Layer%20Deposition%20,Ultratech%20Cambridge%20NanoTech,ALD_Fiji,[align-center]30,[align-center]90,[align-center]150|Thermal%20Evaporator%20,AJA%20International,Thermal_Evap_O3TH,[align-center]17,[align-center]51,[align-center]85|Ebeam%20and%20Thermal%20Evaporator,AJA%20International,Ebeam_Evap_O8E,[align-center]33,[align-center]99,[align-center]165|Sputtering%20System%20,AJA%20International,Sputter_O8,[align-center]27,[align-center]81,[align-center]135|PECVD,Oxford%20Instruments,PECVD_SYS100,[align-center]40,[align-center]120,[align-center]200|Sputter%20Coater%20,Cressington%20Scientific%20Instruments,Sputter_Coat_108A,[align-center]35,[align-center]105,[align-center]175|UV%20Ozone%20Cleaner%20,SAMCO,UV_Ozone_UV2,[align-center]15,[align-center]45,[align-center]75|Inspection%20Microscope%20%23%203,Nikon%20Instruments,Scope3_Etch,[align-center]0,[align-center]0,[align-center]0|Chlorine%20ICP%20Etcher,Oxford%20Instruments,ICP_Cl_SYS100,[align-center]40,[align-center]120,[align-center]200|Fluorine%20ICP%20Etcher,Oxford%20Instruments,ICP_Fl_SYS100,[align-center]40,[align-center]120,[align-center]200|DRIE%20Etcher,Oxford%20Instruments,DRIE_FL_SYS100,[align-center]45,[align-center]135,[align-center]225|Plasma%20Asher%20,PVA%20TePla,Plasma_Asher_ION40,[align-center]20,[align-center]60,[align-center]100|Reactive%20Ion%20Etcher,Oxford%20Instruments,RIE_NPG80,[align-center]35,[align-center]105,[align-center]175|Vapor%20HF%20Etcher,SPTS%20Technologies,VaporHF_Primaxx,[align-center]20,[align-center]60,[align-center]100|Xenon%20Difluoride%20Etcher,SPTS%20Technologies,XeF2_Etch_E1,[align-center]25,[align-center]75,[align-center]125|Electron%20Beam%20Lithography%20,Elionix,EBL_Elionix,[align-center]55,[align-center]165,[align-center]275|Photo%20Resist%20Spinner%20,Brewer%20Scientific,Photo_Spinner,[align-center]18,[align-center]54,[align-center]90|Ebeam%20Resist%20Spinner%20,Brewer%20Scientific,EBL_Spinner,[align-center]18,[align-center]54,[align-center]90|Non%20Standard%20Materials%20Spinner%20,Brewer%20Scientific,Other_Spinner,[align-center]18,[align-center]54,[align-center]90|Mask%20Aligner,EV%20Group,Mask_Aligner_EVG620,[align-center]28,[align-center]84,[align-center]140|Photoresist%20Oven%20-%20Prebake%20,Thermal%20Product%20Solutions,Prebake_Oven,[align-center]0,[align-center]0,[align-center]0|Photoresist%20Oven%20-%20Postbake,Thermal%20Product%20Solutions,Postbake_Oven,[align-center]0,[align-center]0,[align-center]0|3D%20Lithography%20System,Nanoscribe,3DLitho_GT,[align-center]38,[align-center]114,[align-center]190|Inspection%20Microscope%20%23%201,Nikon%20Instruments,Scope1_Litho,[align-center]0,[align-center]0,[align-center]0|Scanning%20Electron%20Microscope,FEI,SEM_NovaNano,[align-center]30,[align-center]90,[align-center]150|Inspection%20Microscope%20%232,Nikon%20Instruments,Scope2_Metrology,[align-center]0,[align-center]0,[align-center]0|Surface%20Profilometer%20,Bruker,Stylus_Prof_Dektak,[align-center]18,[align-center]54,[align-center]90|Ellipsometer%20,J.A.%20Woollam,Ellipsometer_VVase,[align-center]18,[align-center]54,[align-center]90|Atomic%20Force%20Microscope,Bruker,AFM_Dimension,[align-center]28,[align-center]84,[align-center]140|Optical%20Profilometer,Bruker,Optical_Prof_GT-I,[align-center]18,[align-center]54,[align-center]90|Thin%20Film%20Analyzer,Filmetrics,Reflectometer_F20,[align-center]0,[align-center]0,[align-center]0|Rapid%20Thermal%20Annealer,MPT,RTA_600S,[align-center]20,[align-center]60,[align-center]100|Furnace%20-%20LPCVD%20Nitride,Tystar,Furnace_Nitride,[align-center]45,[align-center]135,[align-center]225|Furnace%20-%20LPCVD%20TEOS,Tystar,Furnace_TEOS,[align-center]45,[align-center]135,[align-center]225|Furnace%20-%20Anneal,Tystar,Furnace_Anneal,[align-center]25,[align-center]75,[align-center]125|Furnace%20-%20Thermal%20Oxide,Tystar,Furnace_Thermal_Oxide,[align-center]35,[align-center]105,[align-center]175[/vc_table]

Additional Items

Item Cost Unit
SU-8 Developer $16.63 500 ml
Remover PG $22.88 500 ml
Gold E-Beam Evaporation $0.65 1 nm